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Products guidance of
Ultra high vacuum technology
The vacuum technology is said to be indispensable for future industrial
development not only a semiconductor.
We supply a device related to a vacuum including
the device and vacuum heat treatment equipment for studies of a semiconductor
and the solar battery.
3 source RF sputtering equipment.
with plasma processing room attachment
・ It is equipped with three cathodes and can make a
laminated film and a mixed film.
・ There is transfer mechanism, and the surface treatment
in the plasma processing chamber is possible without
exposing it to the atmosphere.
Electron-beam evaporation equipment 【 10KW 】
This device comprises an electron gun evaporation
source of 10KW with six melting pots and a vapor
deposition control machine, and the semiautomation
of the film formation process is possible.
Standard electron-beam evaporation device 【 2KW 】
In a standard vapor deposition device, electron gun of
2KW and three melting pots are attached to a small
chamber (φ 300).
By optional parts, you are changeable to the resistance
heating vapor deposition device of the 3 source